Method for bonding IC chips to substrates incorporating dummy bumps and non-conductive adhesive and structures formed

ABSTRACT

An IC chip/substrate assembly bonded together by a non-conductive adhesive and a method for forming the assembly. The assembly consists of an IC chip that has bumps formed on an active surface, a substrate that has bond pads formed on a top surface, wherein at least one of the IC chip and the substrate has dummy bumps formed in-between the bumps or the bond pads, and a non-conductive adhesive disposed in between and bonding the IC chip and the substrate together in a face-to-face relationship with the bumps in electrical communication with the bond pads.

FIELD OF THE INVENTION

[0001] The present invention generally relates to a method for formingIC chip/substrate assemblies incorporating dummy bumps and an adhesiveand assemblies formed, more particularly, relates to a method forbonding an IC chip to a substrate by a non-conductive adhesive whereinat least one of the IC chip and substrate is formed with dummy bumps ona surface to be bonded and assemblies formed by the method.

BACKGROUND OF THE INVENTION

[0002] In the fabrication of modern semiconductor devices, the everincreasing device density and decreasing device dimensions demand morestringent requirements in the packaging or interconnecting techniques ofthe devices. In recent years, a flip-chip attachment method or flip-chipdirect chip attachment (DCA) method has been used in packagingintegrated circuit chips. In the flip-chip attachment method, instead ofattaching an integrated circuit lead frame in a package, an array ofsolder balls is formed on the surface of the die for the subsequentbonding to a printed circuit board or an interposer. The formation ofthe solder balls can be carried out by an evaporation method utilizing asolder material consisting mainly of tin and lead through a mask toproduce the balls in a desired pattern. More recently, the techniques ofelectrodeposition or printing have been used to mass produce solderballs in a flip-chip packaging process.

[0003] In the direct chip attachment method, all the interconnectionsbetween a semiconductor chip and a printed circuit board (PCB) or aflexible substrate can be formed simultaneously and therefore maximizingfabrication throughputs. For instance, in direct attachment, solderbumps or solder balls are used to connect a chip directly to a printedcircuit board or a flexible substrate. In a regular printed circuitboard, the density of the interconnections is not formed high enough tomatch that normally found on a chip surface. In other words, the pitchbetween the bond pads formed on a chip is smaller than the pitch formedbetween interconnections on a printed circuit board. An interposer istherefore used to provide a transition and to accommodate the bondpads/interconnections which are spaced differently. An interposer boardis frequently fabricated of the same material as that used in theprinted circuit board, i.e., an epoxy-type polymeric material. When ahigh density interconnect printed circuit board is utilized in aflip-chip method for bonding to a semiconductor chip, the use of theinterposer may not be necessary.

[0004] The use of organic substrates, or polymeric-base substrates, inprinted circuit boards, flexible substrates or interposers introduces anew source of problem for the flip-chip bonding of a silicon chip whichis mostly inorganic to such substrates. The problem is the mismatch ofcoefficients of thermal expansion (CTE) between the printed circuitboard and the silicon chip. The coefficient of thermal expansion for theprinted circuit board material is at least five times that of thesilicon material. The extreme mismatch in CTE's between the silicon chipand the organic substrate of the printed circuit board thereforesubjects solder joints formed therein between to extremely large thermalstrains, which leads to premature failure of the solder connections.

[0005] One method proposed for alleviating such thermal strains is theintroduction of an encapsulating layer between the silicon chip and theorganic substrate. The encapsulating material, known as an underfill,which is typically a silica filled epoxy is used to fill the gap (orstandoff) between the printed circuit board and the silicon chip. Sincethe silicon chip is normally covered, in a final fabrication step, by apolymer passivation/stress buffer layer such as a polyimide film, theunderfill forms a bond between the polyimide layer on the chip and theorganic substrate of the printed circuit board encapsulating the solderjoints.

[0006] Referring initially to FIG. 1, wherein a flip-chip 10 bonded by aplurality of solder balls 12 and an underfill layer 14 is shown. Theencapsulating material, or the underfill layer 14, is typically a silicafilled epoxy for filling the gap, or the standoff, between the printedcircuit board 16 and the silicon chip 18. As shown in FIG. 1, theunderfill layer 14 forms a bond between a polyimide layer 20, which is apassivation/stress buffer layer that covers the silicon chip 18, and theprinted circuit board 16 encapsulating the solder balls 12.

[0007] While the introduction of the underfill layer between a siliconchip and an organic substrate for the printed circuit board has enhancedthe thermal cycling resistance of a flip chip assembly, the dispensingof the underfill material in between a silicon chip and a substrate andfilling the gap is a time consuming task. In one conventional method, asshown in FIGS. 2A-2C, an underfill dispenser 22 is first used todispense an underfill material 24 onto the top surface 26 of a substrate28. A layer 30 of the underfill material 24 is thus formed on the topsurface 26. A chip holder 32, usually a vacuum holder, is then used toposition an IC chip 34 which is pre-deposited with a plurality of solderballs 36 on a top surface 38 over the substrate 28. The IC chip, or die34 is then pressed onto the substrate 28 with the plurality of solderballs 36 connecting to corresponding electrical conductors (not shown)on the surface 26 of the substrate 28. The assembly 40 for the flip chipis then placed in a reflow oven and heated to a temperature not lessthan the reflow temperature for the solder material utilized in theplurality of solder balls 36. The reflow process further cures theunderfill material 30 and improves its mechanical strength.

[0008] Several drawbacks are inherent in this technique, for instance,there is possibly an underfill material layer between the plurality ofthe solder balls on the IC chip and the plurality of electricalconductors on the substrate. Since the underfill material is aninsulating material, this affects the contact resistance formed betweenthe joints. Secondly, in the process of pressing the IC die 34 onto theunderfill material layer 30, air entrapment in the underfill material 30is inevitable. Trapped air bubbles in the underfill material layer 30,or in the epoxy material layer 30, affects the mechanical strengthenhancement by the underfill material and furthermore, affects theadhesion formed between the underfill material and the IC die or thesubstrate.

[0009] In another conventional technique for dispensing underfillmaterials, shown in FIGS. 3A-3F, an underfill material is fed into thestandoff between an IC die and a substrate by the capillary effect onthe underfill liquid. As shown in FIG. 3A, a wafer 42 is first sectionedinto individual dies 44 by a diamond saw 46. The IC dies 44 are providedwith a plurality of solder balls 48 on a top surface 50 of the dies.After all the dies 44 are severed from wafer 42, they are placed in aholder tray 52, as shown in FIG. 3B. In the next step of the process, avacuum head 54 is used to remove an IC die 44 from the tray 52 and toposition the die over a substrate 56. It is noted that a plurality ofelectrical conductors 58, corresponding to the number and positions ofthe solder balls 48 are provided on a top surface 60 of the substrate56. It should be noted that the substrate 56 may be either a printedcircuit board or an interposer. After the IC die 44 is mounted tosubstrate 56 by intimately contacting the solder balls 48 with theelectrical conductors 58, as shown in FIG. 3D, a solder reflow processis carried out to reflow the solder and to form a permanent bond betweenthe IC die 44 and the substrate 56. It should be noted that theplurality of electrical conductors 58 are not shown in FIG. 3D forsimplicity reasons.

[0010] The flip chip package 62 is then ready for the underfill processin which an underfill dispenser 64, such as a liquid syringe, is used todispense an underfill material 66 at an edge of the flip chip package62. Since a gap 68, or the standoff, between the chip 44 and thesubstrate 56 is relatively small, i.e., in the neighborhood betweenabout 50 μm and about 100 μm, a capillary effect causes the underfillmaterial 66 to flow into the gap 68 and fill up the gap. Since theunderfill dispensing process utilizes capillary effect, several factorsmay influence the underfill filling process. For instance, the viscosityof the underfill materials 56 and the temperature of the substrate 56and the IC die 44. Moreover, the capillary flow process for theunderfill material 56 is time consuming, i.e., up to 1 minute flow timeis required to fill under an IC die which has a dimension of 10 mm×10mm. A completed flip chip 62 with the underfill dispensed between the ICdie 44 and the substrate 56 is shown in FIG. 3F.

[0011] In still another conventional technique in bonding an IC chip toa substrate, non-conducting adhesives have been used to achieve thebonding. This is shown in FIGS. 4A and 4B. An assembly 70 is formed byan IC chip 72 and a substrate 74 bonded together by a non-conductiveadhesive 76. Electrical communication between the IC chips 72 and thesubstrate 74 is established between bond pads 78 on the IC chip 72 andthe bond pads 80 on the substrate 74 with gold bumps 82. A seriousthermal mismatch occurs between the non-conductive adhesive 76, thesilicon chip 72, and the polymeric-based substrate 74. After the bondingprocess by the non-conductive adhesive 76, the assembly 70 may bow orwarp due to built-in thermal stresses. This is shown in FIG. 4B. An ICchip/substrate assembly 70 bonded together with a non-conductiveadhesive 76 without containing any fillers in the adhesive cannot pass athermal stress test or any other thermal reliability test. A failedsample of the IC chip/substrate assembly after a thermal stress test,i.e., was cycled between −55° C. and 125° C., is shown in FIG. 5 in anelectronic scanning micrograph.

[0012] In a copending application assigned to the common assignee of thepresent invention, attorney Docket No. 64600-085, a method for bondingan IC chip to a substrate by a non-conductive adhesive containingbetween about 5% and 25% of a non-conductive filler and an ICchip/substrate assembly bonded together by the method are disclosed. Asshown in FIGS. 6A-6D, in the first step of the process, a substrate 90that has bond pads 84 formed on a top surface 86 is provided. Anon-conductive adhesive 88 is then deposited on a top surface 86 tocover the bond pads 84. The nonconductive adhesive contains anon-conductive filler such as silica sand having particle sizes betweenabout 0.2 μm and about 20 μm. An IC chip 94 that has a plurality ofbumps 96 formed on an active surface 98 is then positioned on top of thesubstrate 90. The plurality of bumps may be suitably formed of ametallic material that has a significantly lower hardness when comparedto the hardness of the non-conductive filler particles 92, such that thefiller particles are pressed into the top surface of the bumps 96 andnot to impede electrical communication between the bumps 96 and the bondpads 84.

[0013] In the next step of the process, as shown in FIG. 6C, aninner-lead bonder 110 is used to bond the IC chip 94 and the substrate90 together under suitable heat and pressure forming an ICchip/substrate assembly 100. FIG. 6D shows the assembly 100 after thebonding process is completed in the inner-lead bonder 110.

[0014] The process described in the co-pending application, whilereduces the mismatch in the coefficients of thermal expansion betweenthe IC chip and the substrate to certain extent, does not providesufficient reduction in such mismatch in many circumstances. In otherwords, the deformation shown in FIG. 4B is still observed when suchnon-conductive fillers are used in the underfill, i.e., thenon-conductive adhesive material.

[0015] It is therefore an object of the present invention to provide amethod for bonding an IC chip to a substrate by a nonconductive adhesivewithout the drawbacks or shortcomings of the conventional bondingmethods.

[0016] It is another object of the present invention to provide a methodfor bonding an IC chip to a substrate by a non-conductive adhesivewherein only a minimal amount of the non-conductive adhesive isrequired, thus minimizing the thermal mismatch.

[0017] It is a further object of the present invention to provide amethod for bonding an IC chip to a substrate by a nonconductive adhesiveby forming dummy bumps on at least one of the bonding surfaces of the ICchip and the substrate.

[0018] It is another further object of the present invention to providea method for bonding an IC chip to a substrate by a nonconductiveadhesive by forming dummy bumps on both bonding surfaces of the IC chipand the substrate.

[0019] It is still another object of the present invention to provide anIC chip/substrate assembly bonded together by a nonconductive adhesivewherein dummy bumps are formed on the bonding surface of at least one ofthe IC chip and the substrate.

[0020] It is still another further object of the present invention toprovide an IC chip/substrate assembly bonded together by anon-conductive adhesive in which dummy bumps are formed on the bondingsurfaces of both the IC chip and the substrate.

SUMMARY OF THE INVENTION

[0021] In accordance with the present invention, a method for bonding anIC chip to a substrate by a non-conductive adhesive and an ICchip/substrate assembly bonded together by the method are disclosed.

[0022] In a preferred embodiment, an IC chip/substrate assembly isprovided which includes an IC chip that has bumps formed on an activesurface; a substrate that has bond pads formed on a top surface; atleast one of the IC chip and the substrate has dummy bumps formed inbetween the bumps or the bond pads; and a nonconductive adhesivedisposed in-between and bonding the IC chip and the substrate togetherin a face-to-face relationship with the bumps in electricalcommunication with the bond pads.

[0023] In the IC chip/substrate assembly, the dummy bumps may be formedin a single block, or may be formed in a plurality of elongated strips.The dummy bumps may be formed on the active surface of the IC chipin-between the bumps, or may be formed on the top surface of thesubstrate in-between the bond pads. The dummy bumps may also be formedon both the active surface of the IC chip between the bumps and on thetop surface of the substrate in-between the bond pads. The IC chip maybe a driver chip for a LCD display panel. The substrate may be formed ofa material selected from the group consisting of polymeric material,ceramic, metal and glass. The dummy bumps may be formed of a materialthat has a coefficient of thermal expansion in-between those for the ICchip and the substrate.

[0024] In the IC chip/substrate assembly, the non-conductive adhesivemay be a thermoset polymeric adhesive, or an epoxy-type adhesive. Thedummy bumps may be formed of copper or aluminum. The dummy bumps may beformed in-between the bumps or the bond pads occupying between about 1%and about 100% of an area in-between the bumps or the bond pads, orpreferably between about 30% and about 70% of an area in between thebumps or the bond pads.

[0025] The present invention is further directed to a method for bondingan IC chip to a substrate by a non-conductive adhesive which can becarried out by the operating steps of first providing an IC chip thathas bumps formed on an active surface; then providing a substrate thathas bond pads formed on a top surface; then forming dummy bumps on atleast one of the IC chip and the substrate in-between the bumps or thebond pads; depositing a nonconductive adhesive in between the topsurface of the substrate and the active surface of the IC chip; aligningthe bumps to the bond pads by positioning the active surface of the ICchip juxtaposed to the top surface of the substrate; and pressing the ICchip and the substrate together under heat and pressure until the bumpsare electrically connected to the bond pads.

[0026] The method for bonding an IC chip to a substrate by anon-conductive adhesive may further include the step of forming thedummy bumps in a single block, or the step of forming the dummy bumps ina plurality of elongated strips. The method may further include the stepof forming the dummy bumps on the active surface of the IC chipin-between the bumps, or the step of forming the dummy bumps on the topsurface of the substrate in-between the bond pads, or the step offorming the dummy bumps on the top surface of the substrate in betweenthe bond pads and on the active surface of the IC chip in between thebumps. The bumps may be formed of a metal selected from the groupconsisting of Au, Ni and Sn-containing metal alloys. The substrate maybe formed of a polymeric material, while the non-conductive adhesive maybe formed of a thermoset polymeric-based adhesive. The method mayfurther include the step of pressing the IC chip and the substratetogether in an inner lead bonder tool.

BRIEF DESCRIPTION OF THE DRAWINGS

[0027] These and other object, features and advantages of the presentinvention will become apparent from the following detailed descriptionand the appended drawings in which:

[0028]FIG. 1 is a schematic showing an enlarged, cross-sectional view ofa conventional flip chip package including an IC die and a substratebonded by a plurality of solder balls and an underfill material.

[0029]FIG. 2A is a schematic illustrating a conventional method fordispensing an underfill material on the top surface of a substrate.

[0030]FIG. 2B is a schematic showing the conventional method of FIG. 2Awith an IC chip positioned on top of a substrate.

[0031]FIG. 2C is a schematic illustrating the conventional method fordispensing underfill shown in FIG. 2A after the IC die is bonded to thesubstrate with the underfill material therein between.

[0032]FIG. 3A is a schematic of another conventional method in which adiamond saw is first used to sever IC dies from a wafer.

[0033]FIG. 3B is a schematic illustrating the severed IC dies positionedin a storage tray.

[0034]FIG. 3C is a schematic illustrating an IC die positioned over acorresponding substrate by a vacuum die holding device.

[0035]FIG. 3D is a schematic illustrating an IC die bonded to asubstrate.

[0036]FIG. 3E is a schematic illustrating the flip chip package of FIG.3D with the gap between the die and the substrate filled by capillaryeffect of an underfill material.

[0037]FIG. 3F is a schematic showing a flip chip package of FIG. 3Eafter the gap between the die and the substrate is filled with theunderfill material.

[0038]FIG. 4A is an enlarged, cross-sectional view of a thirdconventional IC chip/substrate assembly assembled together by anon-conductive adhesive.

[0039]FIG. 4B is an enlarged, cross-sectional view of the ICchip/substrate assembly of FIG. 4A showing the effect of thermalmismatch between the adhesive, the substrate and the IC chip.

[0040]FIG. 5 is a graph illustrating an electron scanning micrograph ofthe IC chip/substrate assembly of FIG. 4B after failing a thermal stresstest.

[0041]FIG. 6A is an enlarged, cross-sectional view of a substrate with anon-conductive adhesive deposited on a top surface.

[0042]FIG. 6B is an enlarged, cross-sectional view of the substrate ofFIG. 6A with an IC chip positioned on top.

[0043]FIG. 6C is an enlarged, cross-sectional view of the substrate andIC chip pressed together in an inner-lead bonder.

[0044]FIG. 6D is an enlarged, cross-sectional view of the ICchip/substrate assembly bonded together by the non-conductive adhesive.

[0045]FIG. 7A is an enlarged, cross-sectional view of a presentinvention IC chip/substrate assembly in which dummy bumps are formed onthe top surface of the substrate in-between the bond pads.

[0046]FIG. 7B is an enlarged, cross-sectional view of a presentinvention IC chip/substrate assembly in which dummy bumps are formed onthe active surface of the IC chip in-between the bumps.

[0047]FIG. 7C is an enlarged, cross-sectional view of a presentinvention IC chip/substrate assembly wherein dummy bumps are formed bothon the top surface of the substrate and on the active surface of the ICchip.

[0048]FIG. 8A is a plain view of a preferred embodiment of the presentinvention dummy bumps.

[0049]FIG. 8B is a plain view of another preferred embodiment of thepresent invention dummy bumps formed in a single block.

[0050]FIG. 8C is a plain view of still another preferred embodiment ofthe present invention dummy bumps formed in a plurality of horizontalstrips.

[0051]FIG. 8D is a plain view of yet another preferred embodiment of thepresent invention dummy bumps formed in a plurality of vertical strips.

[0052] These and other objects, features and advantages of the presentinvention will become apparent from the following detailed descriptionand the appended drawings in which:

DETAILED DESCRIPTION OF THE PREFERRED AND ALTERNATE EMBODIMENTS

[0053] The present invention discloses an IC chip/substrate assemblybonded together by a non-conductive adhesive and a method for formingthe IC chip/substrate assembly.

[0054] The IC chip/substrate assembly is formed by an IC chip, asubstrate and a non-conductive adhesive disposed therein between. The ICchip has bumps formed on an active surface, wherein the bumps may beformed of Au, Ni, or Sn-containing (solder-type) alloys.

[0055] The substrate has a plurality of bond pads formed on a topsurface. The plurality of bond pads may be formed of copper, aluminum orany other suitable metal.

[0056] While the present invention method for bonding an IC chip to asubstrate can be used in any semiconductor assembly applications, it isparticularly suitable for bonding an IC chip which is a driver chip fora LCD display panel to a flexible substrate.

[0057] Referring now to FIG. 7A, wherein a present invention ICchip/substrate assembly 120 formed by an IC Chip 122 and a substrate 124is shown. A non-conductive adhesive 88 is used to bond the IC chip 122and the substrate 124 together. A plurality of bumps 96 are joined inelectrical communication with a plurality of bond pads 84.

[0058] Also shown in FIG. 7A, is a plurality of dummy bumps 130 whichare formed on the top surface 126 of the substrate 124. The dummy bumps130 are formed in a plurality of elongated strips such as those shown inenlarged views of FIGS. 8A, 8C or 8D. The function of the plurality ofdummy bumps 130 is to occupy the space in-between the IC chip 122 andthe substrate 124 when they are bonded together such that the use of thenon-conductive adhesive 88 can be reduced or minimized.

[0059] In another preferred embodiment, the plurality of dummy bumps 140is formed on an active surface 128 of the IC chip 122. An ICchip/substrate assembly 150 is thus formed.

[0060] In still another preferred embodiment, shown in FIG. 7C, an ICchip/substrate assembly 160 is formed by an IC chip 122 equipped with aplurality of dummy bumps 140 on its active surface 128, and a substrate124 equipped with a plurality of dummy bumps 130 formed on its topsurface 126. It is noted that, in the preferred embodiment of ICchip/substrate assembly 160, the amount of the non-conductive adhesive88 utilized in-between the IC chip 122 and the substrate 124 isminimized due to the presence of dummy bumps 130 and 140. It should alsobe noted that when both the active surface 128 of the IC chip 122 andthe top surface 126 of the substrate 124 are formed with dummy bumps,the dummy bumps 130 and 140 should be kept at a distance and, thus, donot touch each other in order to avoid the imposition of stresses oneither the IC chip or the substrate.

[0061] The present invention dummy bumps 130, 140 may be formed invarious number of configurations. A few examples are shown in FIGS.8A-8D to illustrate the preferred embodiments. For instance, FIG. 8Ashows the dummy bumps, formed of copper or aluminum, are arranged in aplurality of elongated strips 132. The elongated strip of dummy bumps132 consists of dumbbell portions 134 and narrow connecting portions136. The dumbbell portions 134 are utilized to occupy more volume in thespace between the IC chip and the substrate.

[0062] In another configuration, shown in FIG. 8B, a single block 142 ofdummy bump is utilized to achieve maximum volume occupation. The singleblock of dummy bump 142 may be formed of copper or aluminum.

[0063] In another preferred embodiment, the plurality of elongatedstrips 152 of the dummy bumps are formed in either a horizontaldirection or a vertical direction with space 154 therein between.

[0064] The present invention novel IC chip/substrate assembly bondedtogether by a non-conductive adhesive and a method for forming theassembly have therefore been amply described in the above descriptionand in the appended drawings of FIGS. 7A-8D.

[0065] While the present invention has been described in an illustrativemanner, it should be understood that the terminology used is intended tobe in a nature of words of description rather than of limitation.

[0066] Furthermore, while the present invention has been described interms of one preferred and two alternate embodiments, it is to beappreciated that those skilled in the art will readily apply theseteachings to other possible variations of the inventions.

[0067] The embodiment of the invention in which an exclusive property orprivilege is claimed are defined as follows.

What is claimed is:
 1. An IC chip/substrate assembly comprising: an ICchip having bumps formed on an active surface; a substrate having bondpads formed on a top surface; at least one of said IC chip and saidsubstrate having dummy bumps formed in-between said bumps or said bondpads; and a non-conductive adhesive disposed in-between and bonding saidIC chip and said substrate together in a face-to-face relationship withsaid bumps in electrical communication with said bond pads.
 2. An ICchip/substrate assembly according to claim 1, wherein said dummy bumpsare formed in a single block.
 3. An IC chip/substrate assembly accordingto claim 1, wherein said dummy bumps are formed in a plurality ofelongated strips.
 4. An IC chip/substrate assembly according to claim 1,wherein said dummy bumps are formed on said active surface of said ICchip in-between said bumps.
 5. An IC chip/substrate assembly accordingto claim 1, wherein said dummy bumps are formed on said top surface ofsaid substrate in-between said bond pads.
 6. An IC chip/substrateassembly according to claim 1, wherein said dummy bumps are formed onsaid active surface of said IC chip between said bumps and on said topsurface of said substrate in-between said bond pads.
 7. An ICchip/substrate assembly according to claim 1, wherein said IC chip is adriver chip for a LCD display panel.
 8. An IC chip/substrate assemblyaccording to claim 1, wherein said substrate is formed of a materialselected from the group consisting of polymeric material, ceramic, metaland glass.
 9. An IC chip/substrate assembly according to claim 1,wherein said dummy bumps are formed of a material having a coefficientof thermal expansion in-between those for said IC chip and saidsubstrate.
 10. An IC chip/substrate assembly according to claim 1,wherein said non-conductive adhesive is a thermoset polymeric material.11. An IC chip/substrate assembly according to claim 1, wherein saidnon-conductive adhesive is an epoxy-type adhesive.
 12. An ICchip/substrate assembly according to claim 1, wherein said dummy bumpsare formed of Cu.
 13. An IC chip/substrate assembly according to claim1, wherein said dummy bumps formed in-between said bumps or said bondpads occupy between about 1% and about 100% of an area in-between saidbumps or said bond pads.
 14. An IC chip/substrate assembly according toclaim 1, wherein said dummy bumps formed in-between said bumps or saidbond pads occupy preferably between about 30% and about 70% of an areain-between said bumps or said bond pads.
 15. A method for bonding an ICchip to a substrate by a non-conductive adhesive comprising the stepsof: providing an IC chip having bumps formed on an active surface;providing a substrate having bond pads formed on a top surface; formingdummy bumps on at least one of said IC chip and said substratein-between said bumps or said bond pads; depositing a non-conductiveadhesive in-between said top surface of the substrate and said activesurface of said IC chip; aligning said bumps to said bond pads bypositioning said active surface of the IC chip juxtaposed to said topsurface of the substrate; and pressing said IC chip and said substratetogether under heat and pressure until said bumps are electricallyconnected to said bond pads.
 16. A method for bonding an IC chip to asubstrate by a non-conductive adhesive according to claim 15, furthercomprising the step of forming said dummy bumps in a single block.
 17. Amethod for bonding an IC chip to a substrate by a non-conductiveadhesive according to claim 15, further comprising the step of formingsaid dummy bumps in a plurality of elongated strips.
 18. A method forbonding an IC chip to a substrate by a non-conductive adhesive accordingto claim 15, further comprising the step of forming said dummy bumps onsaid active surface of the IC chip in-between said bumps.
 19. A methodfor bonding an IC chip to a substrate by a non-conductive adhesiveaccording to claim 15, further comprising the step of forming said dummybumps on said top surface of said substrate in-between said bond pads.20. A method for bonding an IC chip to a substrate by a non-conductiveadhesive according to claim 15, further comprising the step of formingsaid dummy bumps on said top surface of said substrate in-between saidbond pads and on said active surface of the IC chip in-between saidbumps.
 21. A method for bonding an IC chip to a substrate by anon-conductive adhesive according to claim 15, wherein said bumps areformed of a metal selected from the group consisting of Au, Ni andSn-containing metal alloys.
 22. A method for bonding an IC chip to asubstrate by a non-conductive adhesive according to claim 15, whereinsubstrate is formed of a polymeric material.
 23. A method for bonding anIC chip to a substrate by a non-conductive adhesive according to claim15, wherein said nonconductive adhesive is a thermoset polymeric-basedadhesive.
 24. A method for bonding an IC chip to a substrate by anon-conductive adhesive according to claim 15 further comprising thestep of pressing said IC chip and said substrate together in an innerlead bonder tool.